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Isimiso se-magnetron sputtering target

2021年8月31日

 

Umgomo we-sputtering target magnetron sputtering:

Inkambu kazibuthe orthogonal nensimu kagesi kungezwa phakathi kwelitshe elichithwe (cathode) kanye ne-anode, kanye negesi edingekayo ye-inert (imvamisa i-Ar gas) igcwele ikamelo eliphezulu lokuhlanza. Amafomu kazibuthe waphakade 250-350 ngaphezulu kwento eqondiwe. Inkambu kazibuthe yaseGaussian, futhi inkambu yamandla kagesi ephezulu ene-orthogonal kagesi kagesi.

Ngaphansi kwesenzo senkambu kagesi, I-Ar igesi i-ion ion nama-electron amahle. Kusetshenziswa i-voltage ethile ephezulu engalungile kulitshe. Ama-elektroni akhishwa kulitshe athintwa amandla kazibuthe kanye namathuba e-ionization wokusebenza kwegesi okwenyukayo, ukwakha i-plasma enamandla kakhulu eduze kwe-cathode. Ngaphansi kwesenzo samandla kaLorentz, Ama-ion ayashesha afike endaweni ebhekiswe kuyo bese ehlasela indawo okuqondiswe kuyo ngejubane elikhulu, ukuze ama-athomu akhiphe ilitshe alandele umgomo wokuguqulwa komfutho futhi andizele kude nendawo ekhonjiwe ngamandla aphezulu we-kinetic. Substrate sebethule ku ifilimu.

Imagnetron sputtering ngokuvamile ihlukaniswe izinhlobo ezimbili: ukukhishwa kwemithamo kanye nokuvama kwemvamisa yomsakazo. Umgomo wezinto ezisetshenziswayo ezilumayo ulula, futhi nezinga layo liyashesha lapho kukhishwa insimbi..Ububanzi besicelo sokukhishwa kwemvamisa yomsakazo bukhulu kakhulu. Ngaphezu kokukhalaza izinto zokuqhuba, izinto ezingezona ezokuqhuba nazo zingakhanywa. Ngesikhathi esifanayo, futhi ingaqhuba ukukhipha okusebenzayo ukulungisa izinto ezihlanganisiwe njengama-oxide, ama-nitride, nama-carbides..Uma imvamisa yerediyo yanda, kuba yi-microwave plasma sputtering. Okwamanje, i-electron cyclotron resonance (ECR) uhlobo lwe-microwave plasma sputtering luvame ukusetshenziswa..

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