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Super-lubricant amorphous carbon film mid-range ordered nanostructure regulation and performance correlation study

Super-lubricant amorphous carbon film mid-range ordered nanostructure regulation and performance correlation study

  Hydrogen-containing amorphous carbon film (aC:H) has caused a research boom at home and abroad as a new type of solid lubricating material due to its excellent properties such as high hardness, low friction, wear resistance and chemical inertness..However, it has problems such as poor toughness and low load bearing, which greatly affects the service life and reliability..This paper starts …

Application of Plasma Spraying Technology in the Preparation of Sputtering Target

Application of Plasma Spraying Technology in the Preparation of Sputtering Target

  In recent years, with the rapid development of global economy and technology, the continuous advancement of multi-functionality and portability of products has made the application of film science increasingly widespread.As the basic consumables of the coating industry, the sputtering target material has also made great progress in its preparation technology..Due to its high density and good adhesion, sputtered films …

Device for preventing short circuit of plane target seat in magnetron sputtering system

Device for preventing short circuit of plane target seat in magnetron sputtering system

  The utility model relates to a device for preventing short circuit of a plane target seat in a magnetron sputtering system.The device for preventing the short circuit of a plane target base in a magnetron sputtering system includes a side protective shield and an anode frame installed around the target base and a target material embedded in the target …

Plasma treatment equipment and sputtering system

Plasma treatment equipment and sputtering system

  Reveal a plasma processing equipment (200) and sputtering system.The plasma processing apparatus includes a source (206) configured to generate plasma (140) in a processing chamber (202) and a plasma sheath regulator (208), the processing chamber (202) having an adjacent workpiece (138) ) Plasma sheath (242) on the front surface.The plasma sheath regulator controls the shape of the boundary (241) …

Planar magnetron sputtering targets with improved utilization

Planar magnetron sputtering targets with improved utilization

  A planar magnetron sputtering target with improved utilization, which is characterized in that it comprises a target magnetron jacket, the bottom surface of the target magnetron jacket is connected to a cover plate, and there is cooling water between the cover plate and the target magnetron jacket , The magnetron is placed inside the target magnetron jacket, there are …

Magnetron sputtering cathode device with good insulation and high utilization rate of target material

Magnetron sputtering cathode device with good insulation and high utilization rate of target material

  The utility model discloses a magnetron sputtering cathode device that can effectively improve the utilization rate of target materials and the overall insulation of the device. The device includes a target base flange on which an insulating plate is fixed, and the insulating plate is provided with A water-cooling tank, a plane target is fixed above the water-cooling tank, …

Overview of Research on Magnetic Field in Magnetron Sputtering System

Overview of Research on Magnetic Field in Magnetron Sputtering System

  Sputtering is the most widely used physical vapor deposition technology in the current integrated circuit coating process.The main goals of research on magnetron sputtering systems can be summarized in the following three aspects: improve coating uniformity, increase substrate deposition rate, and increase target utilization..Among them, the horizontal magnetic field can restrict the movement of secondary electrons near it, extend …

Preliminary Study on Nano-patterns Prepared by Colloidal Etching Process and Pattern Functions

Preliminary Study on Nano-patterns Prepared by Colloidal Etching Process and Pattern Functions

  In order to obtain a simple and cheap nano-pattern processing method, this paper uses a combination of Colloidal Lithography and magnetron sputtering technology to prepare good-quality Nanomesh or Nanonet patterns on the surface of Si and TiO2, respectively. And the preparation process was optimized and analyzed, and finally the preliminary exploration of the material function of the prepared nano …

Research on radio frequency sputtering deposition and properties of barium strontium titanate (BST) thin films

Research on radio frequency sputtering deposition and properties of barium strontium titanate (BST) thin films

  The development demand of monolithic uncooled infrared focal plane array (UFPA) technology puts forward urgent requirements for the development of new and excellent performance ferroelectric thin films and their low-temperature preparation technology, because (BaSr)TiO3 (abbreviated as BST) is a kind of excellent performance Ferroelectric materials, the Curie temperature Tc of the appropriate component BST is near room temperature, the …

Research on Influencing Factors of NiZn Ferrite Film Performance

Research on Influencing Factors of NiZn Ferrite Film Performance

  NiZn ferrite film has the advantages of high resistivity, high Curie temperature, low temperature coefficient, and good high-frequency performance. It is widely used in planar inductors, micro transformers, electromagnetic interference suppressors, etc..This paper mainly studies the effects of ZnFe2O4 buffer layer, substrate type and Mn substitution on the microstructure and magnetic properties of NiZn ferrite films. Preparation of NiZn …

Sputtering targets machining methods

Sputtering targets machining methods

  A method for mechanical processing of a target material includes: a flattening processing technology for the sputtering surface and back surface of the target material blank, and a side surface processing technology for each side of the target material blank, so that the thickness of the target material blank reaches a predetermined thickness, The plane size of the sputtering …

Study on the Preparation of Inorganic Chalcogenide Semiconductor Thin Films and the Performance of Solar Cells

Study on the Preparation of Inorganic Chalcogenide Semiconductor Thin Films and the Performance of Solar Cells

  With the rapid growth of the world’s population, the two major global problems of environmental pollution and energy crisis have become increasingly serious.Compared with the three traditional fossil fuels such as natural gas, coal, and oil, solar energy is an inexhaustible form of clean energy, and its use does not emit greenhouse gases and particulate pollutants..At the beginning of …

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