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The ojiji nke lekwasịrị na agụụ electroplating

2021年10月19日

Ihe a na -atụ anya nwere ọtụtụ ọrụ, na oghere mmepe ahịa buru ibu, it has very good uses in many fields.Almost all new sputtering equipment use powerful magnets to move the electrons in a spiral motion to accelerate the ionization of the argon gas around the target, resulting in an increase in the collision probability between the target and the argon ions.

Mụbaa ọnụego sputtering. N'ozuzu, Ihe mkpuchi ọla na -ejikarị DC sputtering, mgbe ihe seramiiki na-anaghị arụ ọrụ na-eji sputting RF AC. Ụkpụrụ bụ isi bụ iji nchapu ọkụ na oghere iji metụta argon (Na) ion na ihe mgbaru ọsọ. N'elu, the cations in the plasma will accelerate to the surface of the negative electrode as the sputtered material. Mmetụta a ga -eme ka ihe a na -atụ anya na -efepụ wee tinye na mkpụrụ ahụ iji mepụta fim dị gịrịgịrị.

N'ikwu okwu n'ozuzu, ojiji nke sputtering usoro maka film mkpuchi nwere ọtụtụ e ji mara: (1) Ọla, Enwere ike ịme alloy ma ọ bụ insulator ka ọ bụrụ ihe nkiri.(2) N'okpuru ọnọdụ ọnọdụ kwesịrị ekwesị, enwere ike ịme ihe nkiri dị gịrịgịrị nke otu mejupụtara site na ọtụtụ ebumnuche na mgbagwoju anya.(3) Site n'ịgbakwunye oxygen ma ọ bụ gas ndị ọzọ na -arụ ọrụ na ikuku ikuku, enwere ike ịme ngwakọta ma ọ bụ ngwakọta nke ihe elekwasịrị anya na molecule gas.(4) Enwere ike ịchịkwa ntinye eburu n'uche ugbu a na oge ịgbasa, ọ dịkwa mfe ịnweta ọkpụrụkpụ ihe nkiri dị elu.(5) E jiri ya tụnyere usoro ndị ọzọ, ọ na-aka mma maka imepụta ihe nkiri sinima nke nwere nnukwu mpaghara.(6) Ọ fọrọ nke nta ka ọ bụrụ na ike ndọda adịghị emetụta ahụ ahụ, na enwere ike ịhazi ọnọdụ nke ebumnuche na mkpụrụ.

1.The sputtering akụrụngwa bụ mgbagwoju anya na-achọ a elu-voltaji ngwaọrụ

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