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Tantalum

Nnọọ na webụsaịtị anyị Tantalum

  • Ebumnuche Tantalum

    Udi na mkpado:
    Tantalum ,

    Aha ngwaahịa:Tantalum target material
    Ọkwa: Ta1.Ta2.TaW2.5.TaW10.
    elu nkenke ebu:GB/3629-2006
    Ịdị ọcha:≥99.95%
    Condition: annealed (Nna -ukwu) or hard (Y)

    ndị ọrụ mmepụta na ndị ọrụ njikwa mma
    • Udi na mkpado

    Nha:

    Dayameta dị n'èzí (mm) Ọkpụrụkpụ (mm) Ọdịdị nke elu Ụtọ
    50~ 400 3~ 50 32Rms 0.15%
    Rịba ama: Ọ dị mkpa ka a kpaa nkata n'etiti ngwaahịa na ihe achọrọ.

    Ihe achọrọ chọrọ:

    Akara Ọdịnaya mmewere (oke nta %)
    C N H Fe Na Ni Mo W Nb Ta
    Ta1 0.01 0.005 0.015 0.0015 0.005 0.005 0.002 0.002 0.01 0.01 0.05 Ihe fọdụrụ
    Ta2 0.02 0.025 0.03 0.005 0.03 0.02 0.005 0.005 0.03 0.04 0.1 Ihe fọdụrụ
    TaNb3 0.02 0.025 0.03 0.005 0.03 0.03 0.005 0.005 0.03 0.04 1.5~ 3.5 Ihe fọdụrụ
    TaNb20 0.02 0.025 0.03 0.005 0.03 0.03 0.005 0.005 0.02 0.04 17~ 23 Ihe fọdụrụ
    TaNb40 0.01 0.01 0.02 0.0015 0.01 0.005 0.01 0.01 0.02 0.05 35~ 42 Ihe fọdụrụ
    TaW 2.5 0.01 0.01 0.015 0.0015 0.01 0.005 0.01 0.01 0.02 2.0~ 3.5 0.5 Ihe fọdụrụ
    TaW7.5 0.01 0.01 0.015 0.0015 0.01 0.005 0.01 0.01 0.02 6.5~ 8.5 0.5 Ihe fọdụrụ
    TaW10 0.01 0.01 0.015 0.0015 0.01 0.005 0.01 0.01 0.02 9.0~ 11 0.1 Ihe fọdụrụ

    Ngwa: Ebumnuche tantalum na -agbasa bụ mpempe akwụkwọ tantalum nwetara site na nhazi nrụgide, na akwa kemịkal dị elu, obere mkpụrụ ọka, ezigbo nzukọ nchigharị na ịdị n'otu n'ime atọxes.

    Tumadi eji sputtering deposition mkpuchi nke ngwa anya eriri, semiconductor wafer na sekit agbakọtara, Enwere ike iji ebumnuche tantalum maka mkpuchi mkpuchi cathode, akwa agụụ mmiri ihe na -arụ ọrụ, wdg.

    Ọ bụ ihe dị mkpa maka teknụzụ ihe nkiri dị gịrịgịrị. Mgbọ agha na-akụ agha: Mgbapụ na-adọkpụ ngwa agha nke Tantalum mere bụ ụdị ogbunigwe, dị ka ogbunigwe TOW2B.Ta-10W na alloys ndị ọzọ nwekwara ike mee mgboagha na-adụpu ihe agha..

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    1.The sputtering akụrụngwa bụ mgbagwoju anya na-achọ a elu-voltaji ngwaọrụ

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