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Nickel-chromium target is one of the main technologies for preparing thin film materials, and the source material for sputter deposition of thin films is the target material. The thin film deposited by sputtering with the target has high densities and good adhesion. The rapid development of new devices and materials in the microelectronics industry, hluav taws xob, sib nqus, optical, optoelectronic and superconducting thin films have been widely used in high-tech and industrial fields, prompting the sputtering target market is growing in size.

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