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Ka'idar magnetron sputtering sputtering manufa

2021年8月31日

 

Ka'idar sputtering manufa magnetron sputtering:

Ana ƙara filin magnetic orthogonal da filin lantarki tsakanin maƙasudi (katode) da anode, da iskar gas da ake bukata (yawanci Ar gas) An cika shi a cikin babban ɗaki. Siffar maganadisu na dindindin 250-350 a saman abin da ake nufi. A Gaussian Magnetic filin, da filayen wutar lantarki mai ƙarfin lantarki suna samar da filin lantarki na orthogonal.

A karkashin aikin filin lantarki, Ar gas ionizes zuwa tabbatacce ions da electrons. Ana amfani da wani babban ƙarfin lantarki mara kyau zuwa ga manufa. Wutar lantarki da ake fitarwa daga inda aka nufa tana shafar filin magnetic kuma yuwuwar ionization na gas mai aiki yana ƙaruwa, samar da plasma mai yawa kusa da cathode. A karkashin aikin Lorentz karfi, Ar ions suna hanzarta zuwa farfajiyar da ake nufi kuma suna jefa bam din da ake nufi a cikin babban gudu, ta yadda kwayoyin halittar da suka fito daga makasudin suka bi ka'idar jujjuyawar motsi kuma suka tashi daga farfajiyar da aka nufa tare da mafi ƙarfin kuzari.. Sanya ƙasa a cikin fim.

Magnetron sputtering gabaɗaya ya kasu kashi biyu: rabe -rabe na haraji da watsawar mitar rediyo. Ka'idar kayan aikin feshin ruwa mai sauƙi abu ne mai sauƙi, kuma ƙimarsa kuma tana da sauri lokacin ƙera karafa ..Aikin aikace -aikacen watsawar mitar rediyo ya fi yawa. Bugu da kari sputtering conductive kayan, kayan da ba su da motsi kuma za a iya watsa su. A lokaci guda, Hakanan yana iya gudanar da sputtering mai aiki don shirya kayan haɗin gwiwa kamar su oxides, nitrides, da carbides..Idan an ƙara yawan mitar rediyo, ya zama microwave plasma sputtering. A halin yanzu, electron cyclotron resonance (ECR) Ana amfani da sputtering plasma microwave yawanci..

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