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What are the common ceramic Sputtering targets


With the development of the electronics industry, high-tech materials are gradually shifting to thin films, and during the coating period, they develop rapidly. The target is a special electronic material with high added value, and it is the source of sputtering thin film materials..As the basic material for the development of the non-metallic thin film industry, ceramic targets have achieved unprecedented development, and the target market is expanding day by day..

Domestic ceramic flat targets mainly use sintering and binding processes, which can produce a maximum length of 600mm, a maximum width of 400mm, and a maximum thickness of 30mm. The rounded corners, beveled edges, steps and other special shapes can be processed according to customer requirements..

Common ceramic targets mainly include: ITO target, magnesium oxide target, iron oxide target, silicon nitride target, silicon carbide target, titanium nitride target, chromium oxide target, zinc oxide target, silicon monoxide target, cerium oxide target, Zinc sulfide target, silicon dioxide target, zirconium dioxide target, niobium pentoxide target, titanium dioxide target, hafnium dioxide target, titanium diboride target, zirconium diboride target, tungsten trioxide target, aluminum oxide, Target Tantalum pentoxide, niobium pentoxide target, magnesium fluoride target, yttrium fluoride target, zinc selenide target, aluminum nitride target, silicon nitride target, boron nitride target, titanium nitride target, silicon carbide target , Lithium niobate target, praseodymium titanate target, barium titanate target, lanthanum titanate target, nickel oxide target, etc..

Types of ceramic targets:

(1) According to chemical composition, it can be divided into oxide ceramic target, silicide ceramic target, nitride ceramic target, fluoride ceramic target and sulfide ceramic target, etc..Among them, the flat display ITO ceramic target has been widely produced and applied in China.Ceramic targets for high dielectric insulating films and giant magnetoresistance ceramic targets have broad application prospects.

(2) According to the application, it can be divided into semiconductor-related ceramic targets, display ceramic targets, magnetic recording ceramic targets, optical recording ceramic targets, superconducting ceramic targets, giant magnetoresistance ceramic targets, etc..

Ceramic targets only account for a very small part of the existing complex electronic product manufacturing, but they play a role as a basic leading material for the information industry..my country’s electronic information industry is developing rapidly, and the demand for ceramic sputtering targets is increasing year by year. The future research and development of ceramic sputtering targets will be an important topic for our country’s target suppliers..

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