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How does the relative density and porosity of the target material affect the quality of the coating??

2021年10月10日

The relative density of the target is the ratio of the actual density of the target to the theoretical density. The theoretical density of the single-component target is the crystalline density. The theoretical density of the alloy or mixture target is determined by the theoretical density of each component and its composition in the alloy or mixture. Calculated by percentage.The structure of the thermal spraying target is loose and porous, and the oxygen content is high (even if it is vacuum spraying, it is difficult to avoid the production of oxides and nitrides in the alloy target), the surface is gray, lacks metallic luster, and adsorbed impurities and moisture are the main factors. The pollution source hinders the rapid acquisition of high vacuum, easily leads to discharge during the sputtering process, and even burns the target material.

At the same time, the instantaneous high temperature of the sputtering surface of the target will easily cause the loose particles to fall off, contaminate the glass surface, and affect the quality of the coating..There are clear regulations for point release of the coated glass surface. The higher the relative density, the faster the film formation rate and the more stable the sputtering process..According to the difference in the preparation process of the target material, the relative density of the fusion casting target should be guaranteed to be above 98%, and the powder metallurgy target should be guaranteed to be above 97% for production use..Therefore, it is necessary to strictly control the density of the target material to reduce the occurrence of slag drop..The spraying target material has low density and low preparation cost. When the relative density can guarantee more than 90%, it generally does not affect the use. At present, the SiA1 targets used in China are all spraying targets..

In addition to densification, if the target material is abnormal during the production process, such as large particles falling off or shrinking holes when heated, more pores (internal defects) will be formed, and the inside of the target material will appear larger (melting target>2mm, spraying target> 0.5mm) or denser holes will discharge due to the concentration of charges, which will affect the use.Targets with low density and pores are prone to chipping during subsequent processing, handling or installation.The target material with high relative density and few pores has good thermal conductivity, and the heat on the surface of the sputtering target material is easily and quickly transferred to the inner surface of the target material or the cooling water in the liner, and the heat dissipation is good, thus ensuring the stability of the film forming process.

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    Shaanxi Zhongbei Titanium Tantalum Niobium Metal Material Co., Ltd. is a Chinese enterprise specializing in the processing of non-ferrous metals, serving global customers with high quality products and perfect after-sales service.

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